References
- J. Vac. Sci. Technol. A v.12 M. W. Cole;W. Y. Han;L. M. Casas;D. W. Eckart;K. A. Jones https://doi.org/10.1116/1.578980
- J. Vac. Sci. Technol. B v.10 W. L. Chen;J. C. Cowles;G. I. Haddad;G. O. Munns;K. W. Eisenbeiser;J. R. East https://doi.org/10.1116/1.586067
- Appl. Phys. Lett. v.71 I.-H. Kim;S. H. Park;T.-W. Lee;M.-P. Park https://doi.org/10.1063/1.119421
- 한국진공학회지 v.7 김일호;박성호;김좌연;이종민;이태우;박문평
- Jpn. J. Appl. Phys. v.37 I.-H. Kim;S. H. Park;J.-W. Kim;J.-M. Lee;T.-W. Lee;M.-P. Park
- J. Appl. Phys. v.79 P. H. Hao;L. C. Wang;Fei Deng;S. S. Lau;J. Y. Cheng https://doi.org/10.1063/1.361788
- Appl. Phys. Lett. v.54 L. C. Wang;S. S. Lau;E. K. Hsieh;J. R. Velebir https://doi.org/10.1063/1.101032
- Appl. Phys. Lett. v.48 E. D. Marshall;W. X. Chen;C. S. Wu;S. S. Lau;T. F. Keuch https://doi.org/10.1063/1.96498
- Phys. Rev. B v.32 J. Tersoff https://doi.org/10.1103/PhysRevB.32.6968
- Appl. Phys. Lett. v.23 K. Kajiyama;Y. Mizushima;S. Sakata https://doi.org/10.1063/1.1654957
- Appl. Phys. Lett. v.60 L. C. Wang;T. Z. Li;M. Kappes;S. S. Lau;D. M. Hwang;S. A. Schwarz;T. Sands https://doi.org/10.1063/1.106794
- J. Electron. Mater. v.19 R. Bruce;D. Clark;S. Eicher https://doi.org/10.1007/BF02733810
- J. Appl. Phys. v.68 L. C. Wang;X. Z. Wang;S. N. Hsu;S. S. Lau;P. S. D. Lin;T. Sands;S. A. Schwarz;D. L. Plumton;T. F. Keuch
- Appl. Phys. Lett. v.60 L. R. Zheng;S. A. Wilson;D. J. Lawrence;S. I. Rudolph;S. Chen;G. Braunstein https://doi.org/10.1063/1.106491
- Electron. Lett. v.32 L. C. Wang;M.-H. Park;H. A. Jorge;I. H. Tan;F. Kish https://doi.org/10.1049/el:19960224
- IEEE Electron Device Lett. v.7 W. X. Chen;S. C. Hsueh;P. K. L. Yu;S. S. Lau https://doi.org/10.1109/EDL.1986.26443
- J. Appl. Phys v.79 P. H. Hao;L. C. Wang;J. C. P. Chang;H. C. Kuo;J. M. Kuo https://doi.org/10.1063/1.361191
- J. Appl. Phys. v.62 E. D. Marshall;B. Zhang;L. C. Wang;P. F. Jiao;W. X. Chen;T. Sawada;S. S. Lau;K. L. Kavanagh;T. F. Fuch https://doi.org/10.1063/1.339705
- J. Appl. Phys. v.67 C. J. PalmstrΦm;S. A. Schwarz;E. Yablonovitch;J. P. Harbison;C. L. Schwarz;L. T. Florez;T. J. Gmitter;E. D. Marshall;S. S. Lau https://doi.org/10.1063/1.345258