Journal of Korean Vacuum Science & Technology
- Volume 6 Issue 1
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- Pages.8-11
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- 2002
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- 1226-6167(pISSN)
Depth Distributions of $Bi^{+}$ Ions Implanted into Ni, Si and $SiO_2$ , Films
- Wang, Ke-Ming (Department of Physics and National Laboratory of Crystal Materials, Shandong University) ;
- Feng Chen (Department of Physics, Shandong University) ;
- Wang, Xue-Lin (Department of Physics, Shandong University) ;
- Zhang, Jian-Hua (Department of Physics, Shandong University) ;
- Liu, Xiang-Dong (Department of Physics, Shandong University)
- Published : 2002.06.01
Abstract
Ni, Si and
Keywords