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Photoluminescence of Li-doped Y2O3:Eu3+ thin film phosphors grown by pulsed laser deposition

  • Published : 2002.11.30

Abstract

$Y_2O_3:Eu^{3+}$ and Li-doped $Y_2O_3:Eu^{3+}$ thin films have been grown on sapphire substrates using a pulsed laser deposition technique. The thin film phosphors were deposited at a substrate temperature of $600^{\circ}C$ under the oxygen pressure of 100, 200 and 300 mTorr. The films grown under different deposition conditions have been characterized using microstructural and luminescent measurements. The crystallinity and photoluminescence (PL) of the films are highly dependent on the oxygen pressure. The PL brightness data obtained from $Y_2O_3:Eu^{3+}$ films grown under optimized conditions have indicated that sapphire is one of the most promising substrate for the growth of high quality $Y_2O_3:Eu^{3+}$ thin film red phosphor. In particular, the incorporation of $Li^{+}$ ions into $Y_2O_3$ lattice could induce a remarkable increase of PL. The highest emission intensity was observed with LiF-doped $Y_{1.84}Li_{0.08}Eu_{0.08}O_3(Y_2O_3LiEu)$, whose brightness was increased by a factor of 2.7 in comparison with that of $Y_2O_3:Eu^{3+}$ films. This phosphor may promise for application to the flat panel displays.

Keywords

References

  1. J. Electrochem. Soc. v.117 no.3 The efficiency of Cathode Ray Phosphors J. D. Kingsley;G. W. Ludwig https://doi.org/10.1149/1.2407510
  2. J. Electrochem. Soc. v.136 no.6 Degradation Mechanism for Low Voltage Cathocdoluminescence of sulfide phosphors S. Itoh;T. Kimizuka;T. Tonegawa https://doi.org/10.1149/1.2097024
  3. J. Vac. Sci. Technol. v.A14 no.3 Degradation of zinc sulfide phosphors under electron bombardment T. H. C. Swart;J. S. Sebasebian;T. A. Tronier;S. L. Jones;P. H. Holloway
  4. J. Electrochem. Soc. v.111 no.1 Luminescent Behavior of the Rare Related Hosts A. Wickersheim;R. A. Lefever https://doi.org/10.1149/1.2426061
  5. Thin Solid Films v.199 no.1 Electrical behavior of electron-beam-evaporated yttrium oxide thin films on silicon R. N. Sharma;S. T. Lakshami;A. C. Rastogi https://doi.org/10.1016/0040-6090(91)90045-Y
  6. J. Vac. Sci. Technol. v.A11 no.4 Sputter deposition of yttrium-oxides A. F. Jankowski;L. R. Schrawyer;J. P. Hayes
  7. J. Appl. Phys. v.66 Dieiectric properties of rf-sputtered Y₂O₃ thin film K. Onisawa;M. Fuyana;K. Tamura;K. Taguchi;T. Nakayama;Y. Ono
  8. Thin Solid Films v.226 no.1 Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering W. M. Crantom;D. M. Spink;R. Stevens;C. B. Thomas https://doi.org/10.1016/0040-6090(93)90222-B
  9. Solid State Commun. v.99 no.6 Growth and characterization of Y₂O₃:$Eu^{3+}$ phosphor films by sol-gel process R. Rao https://doi.org/10.1016/0038-1098(96)00249-9
  10. Phys. Rev. v.B41 pulsed-laser evaporation technique for deposition of thin film : Physic and theoretical model R. K. Singh;J. Narayan
  11. Pulsed Laser Deposition of Thin Films A. Gupta
  12. Mater. Res. Soc. Symp. Proc. v.341 Properties of laser-deposited ytria films on CdTe and silicon substrates A. Greer;M. Tahal https://doi.org/10.1557/PROC-341-87
  13. J. Vac. Sci. Technol. v.A13 no.3 Large-area pulsed laser deposition : techniques and applications James Greer
  14. Phys. Rev. v.B45 Electronic structure and optical properties of europium-activated yttrium oxide phosphor K. C. Misbra;J. K. Berkowitz;K. H. Johnson;P. C. Schmidt
  15. Mater. Sci. & Eng. v.B38 no.3 Mixing LiF in Gd₂O₃:Eu to enhance ultraviolet radiation induced thermoluminescent sensitivity after sintering process S. M. Yeh;C. S. Su