Synthesis of Newel Positive Type Photosensitive Polyimide

  • Ahn, Byung-Hyun (Division of Materials Engineering, Pukyong National University) ;
  • Lee, Dae-Woo (Division of Chemical Engineering, Pusan National University) ;
  • Lee, Jin-Kook (Division of Chemical Engineering, Pusan National University)
  • Published : 2001.10.01

Abstract

Tricyclic aliphatic dianhydride monomer, tricycle[4.2.2.0]dec-9-ene exo, endo-3,4: 7,8-tetra-carboxylicdianhydride (TCDDA), was synthesized by photochemical reaction and poly(amic acid)s from TCDDA and diamines such as 1,4-bis-(4-aminophenoxy)benzene (BAB), 2,2-bis(4-(4-aminophenoxy) phenyl) propane (BAPP), 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane (BAPHF), bis(4-(4-ami-nophenoxy) phenyl)sulfone (BAPS), and 1,4-bis-(4-aminophenoxy)biphenyl (BABP) were prepared. The inherent viscosities of the poly(amic acid)s were between 0.39 and 0.50 dL/g. The poly(amic acid)s were converted to polyimide films by thermal imidization. The glass transition temperatures (T$\_$g/) of the polyimides were in the range of 201-263$\^{C}$. The thermogravimetric analysis (TGA) thermogram of these polyimides showed the temperatures of 5% weight losses between 375 and 393$\^{C}$ in nitrogen atmosphere. To show their utility for image generation, degradations of these polyimides in UV exposure were investigated by UV spectroscopy.

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