Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 34 Issue 3
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- Pages.258-263
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- 2001
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Properties of Spin-On-Glass Siloxane Thin Films Fluorine-doped by CF$_4$ Plasma
CF$_4$ 플라즈마 처리로 불소를 첨가한 실록산 Spin-On-Glass 박막의 특성
Abstract
Siloxane thin films were fabricated on a silicon wafer by spin-coating using a siloxane solution made by the sol-gel process. Fluorine was doped using
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