Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Preparation of Silica Membrane by CVD of Phenyl-Substituted Methoxysilane and $CO_2$ Separation

페닐기로 치환된 Methoxysilane의 CVD에 의한 실리카 분리막의 제조 및 $CO_2$ 분리

  • Kim, Seong-Su (School of Environmental System Engieering and Industrial Hydiene, Cathilic University of Pusan) ;
  • Seo, Bong-Guk (Separation Research Cecter, Korea Research Institute of Chemical Technology) ;
  • Lee, Yun-Bok (School of Materials Science & Engineering, Pusan National University) ;
  • Park, Hong-Chae (School of Materials Science & Engineering, Pusan National University) ;
  • Kim, Tae-Ok (School of Materials Science & Engineering, Pusan National University)
  • 김성수 (부산카톨릭대학교 산업환경시스템학부) ;
  • 서봉국 (한국화학연구소 분리막다기공소재연구센터) ;
  • 이윤복 (부산대학교 재료공학부) ;
  • 박홍채 (부산대학교 재료공학부) ;
  • 김태옥 (부산대학교 재료공학부)
  • Published : 2001.07.01
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Abstract

The CVD film of methoxysilane derived from diphenyldimethoxysilane(DPDMS) was formed on the outer surface of a porous ${\alpha}-alumina$ support tube coated(via dipping-drying-calcining) with a boehmite sol(0.3 mol-Al/L). The resulting silica membrane($500^{\circ}C,\;P_{fe}\;=\;130\;Pa$) showed a permeance of $5.18{\times}10^{-8}\;mol\;{\cdot}\;m^{-2}{\cdot}s^{-1}{\cdot}Pa^{-1}\;for\;CO_2$ and a permselectivity of 13.35 for $CO_2/N_2\;at\;30^{\circ}C$.

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References

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