단일원료를 사용한 MOCVD법에 의한 YBCO 박막의 제조

Fabrication of YBCO thin films by a MOCVD technique using a single solution source

  • Kim, Ho-Jin (Functional Materials Laboratory, Korea Atomic Energy Research Institute. School of Advanced material Engineering, Sungkyunkwan University) ;
  • Joo, Jin-Ho (School of Advanced materials Engineering, Sungjyunkwon University) ;
  • Jung, Choong-Hwan (Functional Materials Laboratory, Korea Atomic Energy Research Institute) ;
  • Lee, Hee-Gyoun (Functional Materials Laboratory, Korea Atomic Energy Research Institute) ;
  • Hong, Gye-Won (Korea Polytechnic University)
  • 발행 : 2001.01.01

초록

To establish the deposition condition of YBCO thin film on MgO single crystal substrates, processing parameters of deposition temperature, chemical composition and oxygen partial pressure were controlled. When using a Ba-deficient composition of YB $a_{1.8}$ $Cu_3$$O_{x}$, non-superconducting phase like CuO, $CuYO_2$ were formed, but BaCu02 was formed together with Yl23 phase when the starting composition was Ba-rich ($YBa_{2.3}$ $Cu_3$ $O_{x}$). The epitaxially grown Yl23 phase was formed at 760-$810^{\circ}C$ and $P_{O2}$=0.29-0.91 Torr.r.r.r.

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