The Influence of Charged Static Electricity on LCD Glass and Neutralization Characteristic by Soft X-ray

  • Choi, Chang-Hoon (Department of Control & Instrumentation Engineering, University of Seoul) ;
  • Han, Sang-Ho (Department of Control & Instrumentation Engineering, University of Seoul) ;
  • Park, Sun-Woo (Department of Control & Instrumentation Engineering, University of Seoul) ;
  • Yun, Hae-Sang (Department of Electronics Engineering. University of Chungwoon)
  • 발행 : 2000.12.21

초록

We observed that static electricity has an influence on the etching unformity of dry etching process. When the static electricity was applied from-200[V]to-1000[V] on glass substrates, the etching rate uniformity was changed to 1.5%-15%. In this experiment, the soft X-ray to neutralize static electricity was adopted as ore of neutralization methods. As an experimental result, soft X-ray irradiation improved neutralization capability on the surface of LCD glass substrate within the short time, about 15-30sec. The difference of etching rate uniformity was below 0.5%.

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