다결정 Si 기판의 진공주조법에 관한 연구

A Study on the Vacuum Casting of Poly-Si Wafer

A vacuum casting was proposed as a new fabrication method of Si wafer for solar cell substrate. It was tried to fabricate a Si plate with good properties and to reduce the production cost by direct vacuum casting. By $5{\sim}10$ cmHg of pressure difference Si plate with $50{\times}46{\times}1.5\;mm^3$ was fabricated. For the preventing of the reaction between graphite mold and Si melt, BN powder coating or BN insert were used. The Si wafer was poly crystalline with 100 ${\mu}m{\sim}1$ mm order of grain size. And there were some twins and dislocations in the grains.