Journal of Korean Vacuum Science & Technology
- 제4권4호
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- Pages.97-101
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- 2000
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- 1226-6167(pISSN)
Nitrogen-incorporated (Ba, Sr)$TiO_3$ thin films fabricated by r.f.- magnetron sputtering
- Lim, Won-Taeg (Department of Physics, Hanyang University) ;
- Jeong, Yong-Kuk (Department of Physics, Hanyang University) ;
- Lee, Chang-Hyo (Department of Physics, Hanyang University)
- 발행 : 2000.12.01
초록
In this study, two kinds of barium strontium titanate (BST) samples were prepared. One is a conventional BST film that is sputtered in a mixture of argon and oxygen. The other is a nitrogen-incorporated BST film that is sputtered in a mixture of oxygen and intentionally added nitrogen instead of argon gas. The structural properties of both of the BST films had not changed significantly with the species of sputtering gas. However, the leakage current of BST films sputtered at (