초록
Seed crystal 로 bare (0001) 사파이어 기판을 사용하여 hydride vapor Phase epitaxy (HVPE)법을 이용하여 free-standing GaN 단결정기판을 성장시켰다. 일정한 두께의 GaN막을 성장한 후 사파이어 기판을 mechanical polishing 작업으로 제거하여 두께 200 ㎛, 10×10 ㎛ 크기의 free-standing GaN 기판을 얻을 수 있었으며, 성장 전 GaCl 전처리를 수행함으로써 crack이 없는 기판을 제작할 수 있었다. 이렇게 제작된 free-standing GaN 기판의 특성을 SiO/sub 2/ patterned sapphire위에 LEO (Lateral Epitaxial Overgrowth) 방법으로 성장된GaN박막과 double crystal x-ray diffraction (DC-XRD), cathode-luminescence (CL) 및 photoluminescence (PL) 방법으로 특성을 비교하였다.
Free-standing GaN single crystal substrates have been obtained by growing thick GaN epitaxial layers on (0001) sapphire substrates using hydride vapor phase epitaxy (HVPE) method. After growing the GaN thick film of 200 ${\mu}{\textrm}{m}$, a free-standing GaN with a size of 10 mm $\times$10 mm were obtained by mechanical polishing process to remove sapphire substrate. Crack-free GaN substrates have been obtained by GaCl pre-treatment prior to the growth of GaN epitaxial layers. Properties of free-standing GaN substrates have been compared with those of lateral epitaxial overgrowth (LEO) GaN films by double-crystal x-ray diffraction (DC-XRD), cathodoluminescence (CL) and photoluminescence (PL) measurements.