도핑되지 않은 비정질 실리콘의 고밀도 $Cl_2$/HBr/$O_2$플라즈마에 의한 식각 시 나칭효과

Notching Effect during the Etching of Undoped Amorphous Silicon using High Density $Cl_2$/HBr/$O_2$Plasma

The notching effect in etching of undoped amorphous silicon gate had different characteristics and mechanism comparing with reported ones. The undoped amorphous silicon was etched by using HBr gas plasma. First in the region of small line width the potential increased as a result of ions in the exposed surface of oxide and the incident ions between the small line widths were deflected more wide range therefore the depth of notching was shallow and wide. Second in the region of large line width of gate electrons were charged on the top of photoresist and the side of gate a part of ions deflected. The deflected ions were partly charged positive on the side of gate and then these partly charged ions produced potential difference. Therefore ions stored up more at independent line than at dense line and notching became deeper by Br ion bombardments.