Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)
- Volume 13 Issue 10
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- Pages.817-821
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- 2000
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- 1226-7945(pISSN)
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- 2288-3258(eISSN)
Investigation of Annealing Effect for a-SiC:H Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
플라즈마 화학기상 증착방식으로 성장시킨 비정질 실리콘 카바이드 박막의 열처리 효과에 관한 특성분석
Abstract
In this work, we have investigated the dependence of annealing temperature(T