Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Investigation on the Vibration Characteristics of a Symmetric 2DOF Polysilicon Resonator

대칭형 2자유도의 폴리실리콘 공진 구조체에 대한 진동특성 분석

  • Hong, Yun-Sik (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology) ;
  • Lee, Jong-Hyeon (Dept. of Mechatronics, Gwangju Institute of Science and Technology) ;
  • Kim, Su-Hyeon (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology)
  • 홍윤식 (한국과학기술원 기계공학과) ;
  • 이종현 (광주과학기술원 기전공학과) ;
  • 김수현 (한국과학기술원 기계공학과)
  • Published : 2000.11.01
Download PDF
⟨ Previous Next ⟩

Abstract

A new resonator that is fabricated by single polysilicon layer process is presented. The resonator can move in two orthogonal direction on the plane parallel to the substrate. And the resonant frequencies of the two modes are intrinsically designed to be identical since the overall structure of the resonator is symmetric about the two directions of motion. Since the resonator ideally has two identical vibration mode, it can be applied to various micro-devices that requires multi DOF motion, especially to microgyroscopes. To investigate the feasibility of application of the resonator, dynamic model of the resonator including the nonlinear behavior of driving electrodes is derived and evaluated with the fabricated one, and the self-tuning characteristics are proved though experiments.

Keywords

References

  1. W. A. Clark, R. T. Howe and R. Horowitz, 'Surface Micromachined Z-Axis Vibratory Rate Gyroscope,' Solid-State Sensor and Actuator Workshop, Hilton Head, South Carolina, pp. 283-287, June 1996
  2. Y. S. Hong, J. H. Lee, C. S. Lee, W. I. Jang, C. A. Choi, S. Kim, and Y. Kwak, 'Bandwidth analysis of a microgyroscope vibrating in x, y axis and its optimal design,' Proceedings SP1E Vol.3680, Design, Test, and Microfabrication of MEMS and MOEMS, Paris, pp. 939-947, April 1999 https://doi.org/10.1117/12.341161
  3. W.C.Tang et al. 'Laterally Driven Polysilicon Resonant Microstructures,' Proc. IEEE Workshop on Microelectromech. Syst., Salt Lake City, Utah, pp. 53-59, Feb. 1989 https://doi.org/10.1109/MEMSYS.1989.77961
  4. C. A. Choi, C. S. Lee, W. I. Jang, Y. S. Hong, J. H. Lee and B. K. Sohn, 'Stress characteristics of multi-layered polysilicon film for the fabrication of micro resonators,' Jpn. J. Appl. Phys. Vol. 38, Part 1, No. 6A, pp. 3693-3699, June 1999 https://doi.org/10.1143/JJAP.38.3693
  5. J.H. Lee, W. I. Jang, C. S. Lee, Y. I. Lee, C. A. Choi, J. T. Baek and H. J. Yoo, 'Characterization of anhydrous HF gas-phase etching with $CH_3OH$ for sacrificial oxide removal,' Sensor and Actuator A 64, pp. 27-32,1998 https://doi.org/10.1016/S0924-4247(98)80054-X