참고문헌
- Thin Solid Films v.102 Transparent Conductors-A Status Review K. L. Chopra;S. Major;D. K. Pandya
- J. Appl. Phys. v.83 Tin Doped Indium Oxide Thin film: Electrical Properties R. B. H. Tahar;T. Ban;Y. Ohya;Y. Takahashi
- J. Appl. Phys. v.33 Electrical Properties of Single Crystals of Indium Oxide R. L. Weiher
- J. Appl. Phys. v.79 Structure and Properties of Tin-Doped Indium Oxide Thin Films Prepared by Reactive Electron-Beam Evaporation with a Zone-Confining Arrangement I. A. Rauf
- Appl. Phys. Lett. v.31 Effect of O₂Pressure during Deposition on Properties of rf Sputtered Sn-Doped In₂O₃Films J. C. C. Fan;F. J. Bachner;G. H. Foley
- J. Appl. Phys. v.63 Electrical and Optical Properties of Indium Tin Oxide Thin Films Prepared on Low-Temperature Substrates by rf Magnetron Sputtering under an Applied External Magnet Field H. Nanto;T. Minami;S. Orito;S. Takada
- Thin Solid Films v.263 Preparation and Properties of Transparent Conducting Indium Tin Oxide Films Deposited by Reactive Evaporation H. L. Ma;D. H. Zhng;P. Ma. S. Z. Win;S. Y. Li
- Thin Solid Films v.326 Dependence of Oxygen Flow on Optical and Electrical Properties of DC-magnetron Sputtered ITO Films M. bender;W. Seelig;C. Daube;H. Frankenberger;B. Ocker;J. Stollenwerk
- Thin Solid Films v.230 Density, Thickness and Interface Roughness of SiO₂,TiO₂and Ta₂O₃on BK-7 Galsses Analyzed by X-ray Reflection M. Huppauff;K. Bange;B. Lengeler
- Phys. Rev. v.95 Surface Studies of Solid by Total Reflection of X-ray L. G. Parratt
- Residual Stress I. C. Noyan;J. B. Cohen
- Thin Solid Films v.238 A Microstructural Study of Low Resistivity Tin-Doped Indium Oxide Prepared by D. C. Magnetron Sputtering Y. Shigesato;D. C. Paine
- Thin Solid Films v.259 Origin of Characteristic Grain-subgrain Structure of Tin-doped Indium Oxide Films M. Kamei;Y. Shigesato;S. Takaki
- Introduction to Solid State Physics, 5th Ed. C. Kittel
- Appl. Phys. Lett. v.64 Heteroepitaxial Growth of Tin Doped Indium Oxide Films on Single Crystalline Yttria Stabilized Zirconia Substrates M. Kamei;T. Yagami;S. Takaki;Y. Shigesato
- Coatings on Glass H. K. Pulker
- Thin Solid Films v.358 Influence of Film Density on Residual Stress and Resistivity for Cu Thin Films Deposited by Bias Sputtering H. M. Choi;S. K. Choi;O. Anderson;K. Bange
- Thin Solid Films v.68 Mechanical Stresses in D. C. Reactive Sputtered Fe₂O₃Thin Films V. Orlinov;G. Sarov
- J. Vac. Technol. v.A12 Characterization of Silver Films Deposited by Radio Frequency Magnetron Sputtering N. Marechal;E. Quesnel;Y. Pauleau
- Thin Solid Films v.278 Depth Profiling of Thin ITO Films by Grazing Incidence X-ray Diffraction D. G. Neerinck;T. J. Vink
- Thin Solid Films v.288 Effect of Substrate on the Structural and Optical Properties of Chemical-bath-deposited CdS Films D. Bhattacharyya;M. J. Carter
- Thin Solid Films v.266 On the Homogeneity of Sputter-Deposited ITO Films Part I. Stress and Microstructure T. J. Vink;W. Walrave;J. L. C. Daams;P. C. Baarslag;J. E. A. M. van den Meerakker
- Thin Solid Films v.171 Note on the Origin of Intrinsic Stresses in Films Deposited via Evaporation and Sputtered F. M. D'Heurle;J. M. E. Harper
- J. Voc. Sci. Technol. v.A7 Stress Dependence of Reactively Sputtered Aluminum Nitride Thin Films on Sputtering Parameters G. L. Huffman;D. E. Fahnline;R. Messier;L. J. Pilione
- Critical Reviews in Solid State and Materials Sciences v.17 Intrinsic Stress in Sputter-Deposited Thin Films H. Windischmann
- Thin Solid Films v.81 Energetic Oxygen Particles in the Reactive Sputtering of Zn Targets in Ar/O₂Atmospheres K. Tominaga;T. Murayama;Y. Sato;I. Moti
- Thin Solid Films v.92 Ion-beam-induced Texture Formation in Vacuum-Dondensed Thin Metal Films D. Dobrew