Journal of the Korean Institute of Telematics and Electronics D (전자공학회논문지D)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Analysis of Topological Effects of Phase-Shifting Mask by Boundary Element Method

경계요소법을 이용한 위상변이 마스크의 단차 효과 분석

  • Lee, Dong-Hoon (School of Electrical and Computer Engineering, Inha University) ;
  • Kim, Hyun-Jun (School of Electrical and Computer Engineering, Inha University) ;
  • Lee, Seung-Gol (School of Electrical and Computer Engineering, Inha University) ;
  • Lee, Jong-Ung (Dept. of Optical Engineering, Chongju University)
  • 이동훈 (仁荷大學校 電子電氣컴퓨터工學部) ;
  • 김현준 (仁荷大學校 電子電氣컴퓨터工學部) ;
  • 이승걸 (仁荷大學校 電子電氣컴퓨터工學部) ;
  • 이종웅 (淸州大學校 光學工學科)
  • Published : 1999.11.01
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Abstract

The boundary element method was newly implemented into an optical lithography simulator so that it could evaluate rigorously the topological effects of 2dimensional phase-shifting masks. Both transparent and periodic boundary conditions were applied for the method, and the continuity conditions were used for treating interface nodes. The accuracy of the module developed for simulating aerial images was verified by comparison with analytic solutions and published results. In addition, it was found that our simulator would be more efficient than the conventional method based on the rigorous coupled wave analysis in views of the convergence and the calculation speed. Finally, the optimal design of two phase-shifting masks was performed.

3차원 위상변이 마스크의 단차 효과를 분석하기 위해 투명 경계조건, 주기적인 경계조건, 및 연속조건을 가진 경계요소법을 광 리소그래피 공정 시뮬레이션에 새로이 적용하였으며, 해석적인 해와 참고문헌의 결과와 비교함으로써 구현된 모듈의 정확성을 검증하였다. 또한, 기존의 rigorous coupled wave analysis에 의한 방법에 비해 수렴성과 계산 시간 측면에서 경계요소법을 이용하는 것이 더 효율적임을 확인하였다. 끝으로 비교적 간단한 위상변이 마스크와 다층-위상변이 마스크에 대한 최적 설계 과정을 기술하였다.

Keywords