Field emission of diamond films grown on glass substrates at low temperatures

  • Lee, S.W. (Myong Ji University, Department of Physics) ;
  • Han, I.T. (Display Lab., Samsung Advanced Institute of Technology) ;
  • Lee, N. (Display Lab., Samsung Advanced Institute of Technology) ;
  • Choi, W.B. (Display Lab., Samsung Advanced Institute of Technology) ;
  • Kim, J.M. (Display Lab., Samsung Advanced Institute of Technology) ;
  • Jeon, D. (Myong Ji University, Department of Physics)
  • Published : 1999.04.01

Abstract

Using microwave plasma-enhanced chemical vapor deposition, diamond films were successfully grown on Ti-coated glass substrates at temperatures as low as around 500$^{\circ}C$ in behalf of practical applications to field emitters. Electron emission was observed at turn-on fields below 18V-$\mu\textrm{m}$. Field emission characteristics of diamond films were discussed in terms of their crystalline qualities. diamond films with poorer crystalline qualities showed better field emission properties.

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