Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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The Study of Deep Level Behaviors in Si Contaminated by Iron

Fe 오염에 따른 Si내의 deep level거동에 관한 연구

  • Published : 1999.01.01
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Abstract

We investigated the effects of cooling condition on deep levels and iron precipitate formation in iron-contaminated p-type silicon by DLTS(Deep Level Transient Spectroscopy) and preferential etching technique. Dependency of cooling condition on Bulk Micro-Defect (BMD) and four different iron-related deep traps were observed. For normal cooling condition, T1, T2, T3, T4 traps that related to Fe\ulcorner or Fe-O complex were obtained. However, the trap with activation energy, 0.4 eV was observed for slow cooling condition. The trap caused by the $\textrm{Fe}^{+}\textrm{}^{-}$ pair (H4:0.56eV) were detected only at the case of $\textrm{LN}_{2}$ quenching condition.

Fe 강제오염된 p-Si에서 여러 가지 quenching 조건에 기인한 에너지 준위들을 deep level transient spectroscopy(DLTS)를 이용하여 측정하였으며, 또한 선택 에칭방법/Optical microscope을 이용한 BMD(bulk micro-defeat)측정을 통하여 Fe 침전물 형서에, Fe 확산을 위한 어닐링 후 Cooling 조건이 미치는 영향을 분석하였다. Cooling 조건들이 여러 종류의 hole trap과 bulk micro-defeat(BMD)형성에 영햐을 주는 것으로 나타났으며, normal cooling의 경우 $\textrm{Fe}_{i}$, 또는 Fe-O complex 와 관계있는 $\textrm{T}_{1},\;\textrm{T}_{2},\;\textrm{T}_{3},\;\textrm{T}_{4}$ trap이 나타났으며, Slow Cooling 의 영향으로 인하여 활성화 에너지가 0.4eV에 해당하는 trap들이 관찰되었다. 또한 $\textrm{Fe}^{+}\textrm{}^{-}$ pair(H4: 0.56eV)는 $\textrm{LN}_{2}$ quenching한 경우에서만 나타났다.

Keywords

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