질화규소의 고온정피로거동

Elevated Temperature Static Fatigue in Silicon Nitride

  • 최건 (한국생산기술연구원 생산기반기술개발센터) ;
  • 최배호 (한국생산기술연구원 생산기반기술개발센터) ;
  • 김기영 (한국기술교육대학 재료금속공학과)
  • Choi, Guen (Materials Process Technology R&D Center, Korea Institute of Industrial Technology) ;
  • Choi, Bae-Ho (Materials Process Technology R&D Center, Korea Institute of Industrial Technology) ;
  • Kim, Ki-Yong (Department of Metals and Materials Engineering, Korea Institute of Industrial Technology and Education)
  • 발행 : 1999.01.01

초록

상압소결 질화규소에 대한 고온정피로 거동을 K-t(stress intensity/life test)법에 의해 조사하였다. 정피로 크랙성장속도는 온도의 증가와 함께 증가한다. 온도의 증가에 따라 크랙성장속도가 증가하는 이유는 온도 증가에 따라 파괴인성치가 감소하기 때문으로 판명되었다. 즉 정피로 크랙성장속도 da/dt를 da/dt=AK1m로 나타내면, 이 식의 정수 A는 파괴인성치의 파괴인성치의 함수이도, 지수 m은 온도나 파괴인성치에 관계없이 일정한 상수이다. 그러나 글래스상의 연화가 일어나는 고온의 경우 크랙성장속도는 이상의 관계로부터 벗어남을 발견하고, 그 이유에 대하여 고찰하였다.

Elevated temperature static fatigue behavior of silicon has been investigated by stress intensity/life test method. Static fatigue crack growth rate increase with the increase of temperature. Such tendency is found to be mainly related to the decrease of fracture toughness with the increase of temperature. That is, when static fatigue crack growth rate, da/dt is expressed by da/dt=AK1m, a constant A is a function of fracture toughness Kc and the exponent m is a constant which is independent of temperature or Kc. However, in the case of high temperature that glass phase is softened, the crack growth rate is found to be deviated from the above relation. This reason is, thus, discussed.

키워드

참고문헌

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