Dehydration Behavior of Water-butanol Solutions through Asymmetric Sulfonated Po.ysulfone Membrane

술폰화된 polysulfone 비대칭막의 제조와 이를 이용한 물-부탄올 수용액의 탈수거동

  • 변인섭 (경희대학교공과대학 화학공학과) ;
  • 백귀찬 (경희대학교공과대학 화학공학과) ;
  • 차시환 (김찬대학 소방안전과) ;
  • 권창오 (김천대학 환경과리과) ;
  • 서종원 (신흥대학 환경위생과) ;
  • 김용욱 (경희대학교공과대학 화학공학과)
  • Published : 1999.09.01

Abstract

Asymmetric membranes for pervaporation were prepared with poly sulfone and sulfonated poly sulfone in order to separate water from 90% by weight butanol solution. Chlorosulfonic acid was reacted with trimethylchlorosilane for using as a sulfonating agent. The prepared polymers were characterized with FT-IR and $^1H$-NMR. The thermal properties of the polymers were examined with DSC and TGA. Back titration method was used for the evaluation of the degree of sulfonation or the ion ex¬change capacity. N-methyl-2-pyrrolidone (NMP) and diethyleneglycol dimethyl ether (DGDE) cosolvent were used for the preparation of asymmetric membranes. The cross section and skin layer of the mem¬branes were examined with scanning electron michroscopy to investigate membrane structure formed with cosolvent composition in the casting solution. In this article, the selectivity of the dense films were not different from each other so much. However, the permeation rates were significantly increased as much as 80 times compared to that of dense film.

Polysulfone을 술폰화하여 물-부탄올 용액의 분리를 위한 투과증발용 비대칭막을 제조하였다. 술론화제로는 chlorosulfoneic acid-trimethyulchlorosilane을 반응시킨 후 이용하였다. FT-IR과 $^1H$-NMR을 이용하여 치환여부를 살펴보았고 술폰화정도는 역적정법과 $^1H$H-NMR을 이용하여 구하였다. DSC와 TGA를 이용하여 열적특성변화를 알아보았다. 비대칭막을 제조하기 위하여 N-methyl-2-pyrrolidone(NMP)rhkdiethyleneglycol dimethyl ether (DGDE)의 혼합용매를 사용하였다. SEM을 이용하여 단면과 skinlayer 의 구조변화를 살펴보았다. 한 연구에서 제조한 비대칭막은 dense film에 비하여 물에 대한 선택도는 거의 변화가 없고 투과유량은 약 80배 정도 증가하였다.

Keywords

References

  1. J. Membr. Sci. v.76 Hans O.;E. Karlsson;G. Tragardh
  2. Pervaporation Membrane Separation Process Introduction to pervaporation Neel; R. Y. M. Huang(ed.)
  3. Industrial Processing with Membranes E. Lacey;S. Loeb
  4. J. Membr. Sci. v.33 D. R. Seok;S. G. Kang;S.-T. Hwang
  5. J. Appl. Polym. Sci. v.34 T. Hirotsu
  6. J. Membr. Sci. v.85 F. M. Sun;E. Ruckenstein
  7. J. Appl. Polym. Sci. v.42 E. Ruckenstein;H. H. Chen
  8. J. Membr. Sci. v.81 E. Ruckenstein;F. M. Sun
  9. 멤브레인 v.6 김윤조;전종영;구성희;탁태문
  10. 멤브레인 v.8 김인철;최중구;최남석;김종호;탁태문
  11. Anal. Chem. v.27 S. Fisher;R. Kunin
  12. J. Membr. Sci. v.83 R. Nolte;K. Ladjeff;M. Bauer;R. Mulgaugt
  13. J. Membr. Sci. v.146 B. Krucz;T. Matsuura