Journal of Photoscience

Korean Society of Photoscience (한국광과학회)
권호 표지

Laser Ablation : Fundamentals and applications in Micropatterning and Thin Film Formation

  • J. Heitz (Jonannes-Kepler-Universitat Linz) ;
  • D. Bauerle (Jonannes-Kepler-Universitat Linz) ;
  • E. Arenholz (Jonannes-Kepler-Universitat Linz) ;
  • N. Arnold (Jonannes-Kepler-Universitat Linz) ;
  • J.T. Dickinson (Washington State University)
  • Published : 1999.05.01
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Abstract

We present recent results on ablation mechanism, single-pulse laser micropatterning , pulsed-laser deposition(PLD) and particulates formation accompanying laser ablation, with special emplasis on polymers, in particular polymide, (PI), and polytetrafluoroethylene, (PTFE). Ablation of polymers is described on the basis of photothermal bond breaking within the bulk material. Here, we assume a first order chemical reaction, which can be described by an Arrhenius law. Ablation starts when the density of broken bonds at the surface reaches a certain critical value. Single-pulse laser ablation of polyimide shows a clear-length dependence of the threshold fluence. This experimental result strongly supports a thermal ablation model. We discuss the various possibilities and drawbacks of PLD and describe the morphology, physical properties and applications of PTFE films.

Keywords

References

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