참고문헌
- Jpn. J. Appl. Phys. v.34 Depositon and Electrical Characterization of Very Thin SrTiO₃Films for Ultra Scale Integrated Dynamic Random Access Memory Application C. S. Hwang(et al.)
- VLSI 96 A stack Capacitor Technology with (Ba,Sr)TiO₃Dielectrics and Pt Electrodes for 1Giga-bit Density DRAM S. O. Park(et al.)
- SSDM 91 Single-Target Sputtering Process for PZT Thin Films with Precise Composition Control K. Torii(et al.)
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Appl. Phys. Lett.
v.66
Dierect Current Conduction Properties fo Sputtered Pt/
$(Ba_{0.7}Sr_{0.3})TiO_3$ /Pt Thin Films Capaaitors W. Y. Hsu(et al.) - ISAF 95 Process/Structure/Property Relations of Barium Strontium Titanate Thin Films Deposited by Multi-Ion-Beam Sputtering Technique C. J. Peng(et al.)
- IEDM 96 A Stacked Capacitor with an MOCVD - (Ba,Sr)TiO₃Film and a RuO₂/Ru Storage Node on a TiN-Caped Plug for 4 Gbit DRAMs and beyond H. Yamaguchi(et al.)
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Intergrated Ferroelectrics
v.10
Characterization of
$Ba_{0.5}Sr_{0.5}TiO_3$ Thin Film Capacitors Produced by Pulsed Laser Deposition Q. X. Jia(et al.) -
IEDM 92
ULSI DRAM Technology with
$Ba_{0.7}Sr_{0.3}TiO_3$ Film of 1.3 nm EquivalentSiO_2$ Thickness and$10^{-9} A/cm^2$ Leakage Current E. Fujii(et al.) -
IEDM 91
A Stacked Capacitor with
$(Ba_xSr_{1-x})TiO_3$ for 256M DRAM K. Koyama(et al.) - ISIF 95 v.11 Electrical Properties of Barium Strontium Titanate (BST) Thin Films Deposited on Various Pt-Base Electrodes W. J. Lee(et al.)
- Jpn. J. Appl. Phys. v.32 Preparation and Propertise of (Ba,Sr)Tio₃Thin Films by RF Magnetron Sputtering N. Ichinose(et al.)
- Appl. Phys. Lett. v.64 High dielectric constant (Ba,Sr)TiO₃Thin Films Prepared on RuO₂/Sapphire K. Takemura(et al.)
- Jpn. J. Appl. Phys. v.33 Preparation of Pb(Zr,Ti)O₃Thin Films on Ir and IrO₂Electrodes T. Nakamura(et al.)
- Electrode Materials for Ferroelectric Thin Film Capacitors and Their effect on the Electrical Properties H. N. Al-Shareef;A. I. Kigon
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Jpn. J. Appl. Phys.
v.33
Dielectrical Properties of
$(Ba_xSr_{1-x})TiO_3$ Thin Films Prepared by RF Sputtering for Dynamic Random Access Memory Application T. Kuroiwa(et al.) -
Jpn. J. Appl. Phys.
v.33
Epitaxial Growth and Dielectric Properties of
$(Ba_{0.24}Sr_{0.76})TiO_3$ Thin Film K. Abe;S. Komatsu - Jpn. J. Appl. Phys. v.36 Variation of Electrical Conduction Phenomena of Pt/(Ba,Sr)/Pt Capacitors by Different Top Electrode Formation Processes K. H. Lee(et al.)