A Study on Hydrogen Detection Characteristics of the Pt-MIS Capacitor Device

Pt-MIS 커패시터 소자의 수소가스 검지특성 연구

  • Sung, Yung-Kwon (Dept.of Electrical Engineering, Engineering College, Korea University) ;
  • Yi, Seung-Hwan (Univ. of Hawaii Post. doc) ;
  • Koh, Jung-Hyuk (Dept.of Electrical Engineering, Graduate School of Korea University) ;
  • Rhie, Dong-Hee (Dept.of Electric Engineering, Suwon University)
  • Published : 1999.02.01

Abstract

The characteristics of $H_2$ gas detection have been investigated using the Pt-MIS capacitor composed of the LPCVD nitride on the oxide. The flat band voltage shift is measured as 0.1 V in 1,000 ppm $H_2$ gas ambient and to be independent of Pt catalyst thickness. It is found that the flatband voltage shift is proportional to the hydrogen concentrations. The response and recovery time of Pt-MIS capacitor are 5 mins and 25 mins respectively. The samples of 30nm thick Pt revealed much higher sensitivity than that of 150nm samples. The samples of 150nm Pt showed that the flatband voltage shift of the device is due to the formation of the dipole layer of the adsorbed hydrogen atoms at the Pt-insulator interface.

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References

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