Acknowledgement
Supported by : (주) 삼성전자, 교육부 기초과학연구소
Analytical Science and Technology (분석과학)
- Volume 11 Issue 4
- /
- Pages.311-315
- /
- 1998
- /
- 1225-0163(pISSN)
- /
- 2288-8985(eISSN)
Analysis of Ultra Pure Sulfuric Acid for Semiconductor Using High Resolution ICP-MS
고분해능 ICP-MS를 이용한 반도체용 고순도 황산 분석
Abstract
Ultra trace metal impurities of high-purity sulfuric acid for semiconductor process have been determined in the concentration of lower than ppb (ng/g) level using high resolution inductively coupled plasma mass spectrometer (HR-ICP-MS).The acid samples were evaporated and concentrated by the factor of 20. No clement in the acids exceeded 1ppb level and most of the clements were determined below 10ppt (pg/g). Elements without spectral interference in mass spectrum, such as In, V, Mn, etc, were determined in the concentration of below 1 ppt level The recoveries in the range of 72% to 127.2% for 0.5 ppb spiked sample were obtained.