한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제31권3호
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- Pages.165-170
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- 1998
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
RF 플라즈마를 이용한 다이아몬드 박막의 제조
Fabrication of Diamoud Thin Films using RF Plasma
초록
Deposition of diamond on silicon substrates has been performed by RF HPCVD (Helicon Plasma Chemical Vapor Deposition) from methane-hydrogen gas mixture. Growth properties and deposition condition conditions have been studies as functions of substrate temperature (
키워드