Journal of the Korean Vacuum Society (한국진공학회지)
- Volume 7 Issue s1
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- Pages.167-170
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- 1998
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- 1225-8822(pISSN)
Patterning of CVD Diamond Films For MEMS Application
- Wang, Xiaodong (Shanghai Institute of Metallurgy, Chinese Academy of Sciences) ;
- Yang, Yirong (Shanghai Institute of Metallurgy, Chinese Academy of Sciences) ;
- Ren, Congxin (Ion Beam Laboratory Shanghai Institute of Metallurgy, Chinese Academy of Sciences) ;
- Mao, Minyao (State Key Laboratory of Transducer Technology) ;
- Wang, Weiyuan (State Key Laboratory of Transducer Technoligy)
- Published : 1998.07.01
Abstract
To apply diamond films in microelectromechanical systems(MEMS), it is necessary to develop the patterning technologies of diamond films in the micrometer scale. In this paper, three different kinds of technologies for patterning CVD diamond films carried out by us were demonstrated: selective growth by improved diamond nucleation in DC bias-enhanced microwave plasma chemical vapor deposition (MPCVD) system, selective growth of seeding using diamond-particle-mixed photoresist, and selective etching of oxygen ion beam using Al as the mask. It was show that high selectivity and precise patterns had been achieved, and all the processes were compatible with IC process.
Keywords