Journal of the Korean Vacuum Society (한국진공학회지)
- Volume 7 Issue s1
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- Pages.78-84
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- 1998
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- 1225-8822(pISSN)
Radiation Damage Effects in $NB^+$ Implanted Sapphire After Annealing
- Huang, N.K.Naramoto, H. (Institute of Nuclear Science and Technology, Sichuan UniversityTakasaki Radiation Chemistry Research Establishment, JAERI)
- Published : 1998.07.01
Abstract
Niobium ions of 380 keV energy have been implanted at 300k in sapphire with a dose of
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