한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제11권8호
  • /
  • Pages.652-657
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  • 1998
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  • 1226-7945(pISSN)
  • /
  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

스핀스레이법 의한 $Fe{3-X}-Ni_XO_4$ 페라이트 박막의 제작과 그 특성

The Properties and Manufacturing of $Fe{3-X}-Ni_XO_4$Films by Spin-Spray Ferrite Method

  • 김명호 (경원전문대학교) ;
  • 장경욱 (경원전문대학교 자동차정비과) ;
  • 부정기 (일본 동경공업대학 전자물리공학과)
  • 발행 : 1998.08.01
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초록

We have performed spin-spray ferrite plating of $Fe{_3}{-X}-Ni_XO_4$(X=0.17~0.26) films in the temperature region $T=80~95[^{\circ}C]$. A reaction solution and an oxidizing solution were supplied to a reaction chamber by supply pump. The solubility limit of Ni increases as the substrate temperature increase, from X=0.17 at $80[^{\circ}C]$ to X=0.26 at $95[^{\circ}C]$. All the films are polycrystalline with no preferential orientation, and the magnetization exhibits no definite anisotropy. Grain size in the films increases as X increases, reaching $0.87[\mu{m}]$ at X=0.26.

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참고문헌

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  3. 金屬 表面 技術 v.38 no.9 新技術 · フェテイトめっきによる磁性膜の作製とろの應用 玉浦 裕 (外 1人)
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