SCM440강의 플라즈마 질화특성에 미치는 가스비율의 영향

The Effect of the Gas Ration on the Characteristics of Plasma Nitrided SCM440 Steel

  • 발행 : 1998.09.01

초록

The effect of H2:N2 gas ratio on the case thickness hardness and nitrides formation in the sur-face of SCM440 machine structural steel have been studied by micro-pulse plasma process. The thickness of compound layer increased with the increase of nitrogen content in the gas com-position. The maximum thickness of compound layer the maximum case depth and the maximum surface hardness were about 15.8${\mu}m$, 400${\mu}m$ and Hv765 respectively in the nitriding condition of 250Pa and 70% nitrogen content at $520^{\circ}C$ for 7hrs. Generally only nitride phases such as ${\'{\gamma}}$($Fe_4N$)$\varepsilon(Fe_2}{_3N}$ phases were detected in compound and diffusion layer by XRD analysis. The amount of $\varepsilon(Fe_2}{_3N}$ phase increased with the increase of nitrogen content. The relative amounts and kind of phases formed in the nitrided case changed with the change of nitrogen content in the gas composition.

키워드

참고문헌

  1. Kruppsche Monatshefte v.43 Stickstoff in Eisen, Stahl and Sonderstal A. Fry
  2. U. S. Patent 3181029 J. J. Egan
  3. U. S. Patent 3181029 B. Berghaus
  4. Heat treatment(1976), Metal Soc. Low temperatureion nitriding: Nitriding at temperature below 500 ℃ for tool and precision machine parts B. Edenhofer;T. J. Bewley
  5. Thin solid films v.96 A new low presure plasma nitriding method A. S. Korhonen;E. H. Sirvio
  6. Ind. Heat., April Comparative studies on energy consumption in installations for ion and gas nitriding A. Marclniak;T. Karpinsk
  7. Heat treatment (1973), Metal Soc. Ion itriding C. K. Jones;S. W. martin;D. J. Sturges;M. Hudis
  8. イオン室化法 山中久彦
  9. Metal Progress Production ion nitriding B. Edenhofer
  10. イオン失化法 日本電子工業(株)
  11. Forschungsbericht des Landes NRW Nr 1555 Die Nitridschichtbildung bei der Glimmentladung J. Kobel
  12. March, Glow discharge processes sputtering and plasma etching B. Chapman
  13. Harterei tech. Mitt. v.37 H. Wilhelmi;S. stramke;H. C. Pohl
  14. Physics of thin films v.III L. I. Maissel
  15. Heat treatment of metals v.23 B. Edenhofer
  16. Plasma processing v.4 Plasma chemi A. Szabo;H. Wilhelmi
  17. Electronnaya Obrab. Mater. v.13 Lakhtin Yu. M.;Kogan Ya. D.
  18. Heat treatment of metals B. Edenhofer
  19. Surface and Coatings Technology v.74 no.75 Structure analysis of plasma-nitrided pure iron, surface and coatings technology J. D' Haen;C. Quaeyhaegens;G. Knuyt;M. D' Olieslaeger;L. M. Stals
  20. 型技術 v.2 no.12 Y. Kuwabara
  21. Glow discharge process sputtering and plasma etching B. Chapman
  22. Plasma Surface Eng. v.1 J. Stanislav(et al)
  23. J. of the Korean Soc. for Heat Treat v.7 no.4 Y. H. Kim;M. J. Kim
  24. Thin Solid films v.95 O. T. Inal;C. V. Robino
  25. J. Japan Inst. Metals v.54 no.8 N. Yasumaru
  26. Plasma Materials Int. Plasma Etching D. M. Manos;D. L. Flamm
  27. 鋼熱處理 アウガルト 大和久重雄
  28. Proc. of plasma surface Eng. DMG Int. v.1 K. T. Rie
  29. Materials Science & Eng v.A140 1991Figure caption Y. Sun;T. Bell