Journal of the Korean Institute of Telematics and Electronics D (전자공학회논문지D)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Aerial image analysis of replicated linewidths patterned by synchrontron X-ray proximity lithography

싱크로트론 X선 근접 리소그래피에 의하여 전사되어진 라인의 폭에 대한 에어리얼 이미지 시뮬레이션

  • 이재웅 (순천대학교 전자공학과) ;
  • 서용덕 (포항공과대학교 전자전기공학과) ;
  • 김오윤 (포항공과대학교 전자전기공학과) ;
  • 최보경 (LG 반도체 주식회사 중앙연구소) ;
  • 김희상 (LG 반도체 주식회사 중앙연구소)
  • Published : 1998.02.01
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Abstract

An aerial image simulator for the synchroton X-ray proximity lithography system has been developed. The modal expansion method and Rayleigh-Sommerfeld diffraction theory are used in calculating the aerial image which is formed by diffracting of the partially coherent X-ray, Experimental results of PALC(POSTECH Advanced Lithography Center) lighography system and simulated results are compared. The experimental and theoretical values of the width of replicated lines are consisted with the relative error less than ~5%. The method to determine the divergent angle of X-ray from the analysis of the width of replicated lines is given.

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