Development of Sulfidation Resistant Amorphous Nb-Ni-Al-Si Coating Layer

내황화성 비정질 Nb-Ni-Al-Si 코팅층의 개발

The sulfidation behavior of a sputter-deposited amorphous coating of 69.0%Nb-16.9Ni-11.9%Al-2.2%Si (at.%) has been investigated as a funtion of temperature.(973-1173K) in pure sulfur pressure of 0.01atm. The sulfidation kinetics of the casting obyed the parabolic rate low over the whole temperature ranges studied. The stlfidation rate increased with the temperature, as expected. The sulfide scale, the composition of which was $Al_2S_3,\;NbS_2,\;Ni_{3-x}S_2\;and\;FeCrS_4$, formed on the amorphous coating was primarily bilayered. Both the outer fastgrowing non-protective 4Al_2S_3$scale and the inner slowly-growing protective $NbS_2$,/TEX> scale and the inner slowly-growing protective $NbS_2$ scale had some Fe and Cr dissolution, which evidently came from the base substrate alloy of stainless steel type 304. Belows the coating, Kirkendall void formation was noticed. Nevertheless, a dramatic improvement of sulfidation resistance was achieved by sputter-depositing Nb-2 Ni-Al-Si layer on the stainless steel 304.