분광타원해석법을 이용한 $Ge_2Sb_2Te_5$ 의 복소굴절율 결정

Determination of the complex refractive index of $Ge_2Sb_2Te_5$ using spectroscopic ellipsometry

  • Kim, S. J. (Department of Physics, Ajou University) ;
  • Kim, S. Y. (Department of Physics, Ajou University) ;
  • Seo, H. (LG Corporate Institute of Technology) ;
  • Park, J. W. (LG Corporate Institute of Technology) ;
  • Chung, T. H. (LG Corporate Institute of Technology)
  • 발행 : 1997.12.01

초록

비정질상과 결정상으로 가역변화하는 특성을 이용하여, 기존의 읽기전용 기록매체인 Compact Disk(CD)를 대체할 차세대 광기록매체로 주목받고 있는 Ge$_{2}$Sb$_{2}$Te$_{5}$(GST)의 상태변화에 따른 굴절율과 소광계수, 박막의 두께와 밀도 등 박막상수들을 구하였다. DC 스퍼터링방법으로 제작한 두꺼운 GST의 복소굴절율을 양자역학적 분산식을 이용한 모델링방법으로 구하고, 한편으로는 표면미시거칠기를 AFM(Atomic Force Microscopy)으로 결정한 다음, 타원해석 스펙트럼들을 수치해석적 역방계산하여 구한 복소굴절율과 비교하였다. 결정상과 비정질상일 때의 GST의 복소굴절율을 각각 구하고 이로부터 계산된 반사율을 측정된 반사율과 비교함으로써 수치해석적인 방법이 실제 GST의 복소굴절율과 더 일치하는 값ㅇㄹ 가지게 됨을 확인하였다. 이렇게 구한 GST의 복소굴절율을 기준데이터로 사용하여 실제 설계두께를 가지는 GST박막의 두께 및 표면거칠기층을 정량적으로 구하였다.다.

The complex refractive indices of $Ge_2Se_2Te_5$ which show reversible phase change between the crystalline phase and an amorphous one depending upon the annealing process have been determined in the spectral range of 0.7-4.5 eV. The $Ge_2Se_2Te_5$ films were DC sputter deposited on the crystalline silicon substrate. The spectro-ellipsometry data of a thick film were analyzed following the modelling procedure where the quantum mechanical dispersion relation were used for the complex refractive indices of both the cryastalline phase $Ge_2Se_2Te_5$ and and amorphous phase $Ge_2Se_2Te_5$, respectively. On the other hand, with the surface micro-roughness layer whose effective thickness was determined from AFM analysis, the spectro-ellipsometry data were numerically inverted to yield the complex refractive index of $Ge_2Se_2Te_5$ at each wavelength. With these set of complex refractive indices, the reflectance spectra were calculated and those spectra obtained from the numerical inversion showed better agreement with the experimental reflection spectra for both the cryastalline phase and an amorphous phase. Finally, the thin $Ge_2Se_2Te_5$ film which has the optimum thickness of 26 nm as the medium for optical recording was also analyzed and the quantitative result of the film thickness and the surface microroughness has been reported.

키워드

참고문헌

  1. Jpn. J. Appl. Phys. v.34 Spectroscopic Ellipsometry Studies on Optical Constants of Ge₂Sb₂Te₂Used for Phase Change Optical Disks Tatsunori Ide;Michio Suzuki;Mitsuya Okada
  2. Jpn. J. Appl. Phys. v.28 Electronic dielectric constans of crystalline and amorphous GeSb₂Te₄ and Ge₂Sb₂Te₂semiconductors Ryosuke Yokota
  3. ELLIPSOMETRY AND POLARIZED LIGHT no.4 R.M.A. Azzam;N.M. Bashara
  4. Appl. Opt. v.28 no.14 Simultaneous determination of refractive index, its dispersion and depth-profile of magnesium oxide thin film by spectroscopic ellipsometry K. Vedam;S.Y. Kim
  5. Thin Solid Films v.166 Simultaneous Determination of Dispersion Relation and Depth Profile of Thorium Fluoride Thin Film by Spectroscopic Ellipsometry S.Y. Kim;K. Vedam
  6. Appl. Opt. v.35 no.34 Simultaneous determination of refractive index, extinction coefficient and void distribution of titanium dioxide thim film by optical methods S.Y. Kim
  7. 한국광학회지 v.7 no.4 MNA/PMMA고분자 박막의 복소굴절율 및 두께 결정 김상열
  8. 한국광학회지 v.8 no.4 PECVD방법으로 성장시킨 DLC박막의 복소굴절율 및 성장조건에 따른 박막상수변화 김상준;방현용;김상열;김성화;이상현;김성연