0.18{$mu}textrm{m}$세대 이후의 층간 절연 물질(ILD)연구 동향

  • 발행 : 1997.06.01

초록

키워드

참고문헌

  1. Solid State Technology v.39 no.3 Shyam P. Murarka
  2. MRS Symp. Proc. v.381 H.Kudo;R.Shinohara;M.Yamada
  3. IEEE Trans. Electron devices v.40 no.1 T.Sakurai
  4. Solid State Technology v.38 no.7 N.H.Hendricks
  5. MRS Symp. Proc. v.381 N.H.Hendricks;K.S.Y.Lau;A.Smith;W.B.Wan
  6. Proc. of VMIC T.Furusawa;Y.Homma;Y.Shimomura;H.Morishima;Y.Yamamoto;H.Satoh
  7. Appl.Phys.Lett. v.68 K.Endo;T.Tatsumi
  8. Extended Abstract of SSDM A.Nara;H.Itoh
  9. MRS Symp. Proc. v.381 L.W.Hrubesh
  10. MRS Symp. Proc. v.381 C.H.Ting;T.E.Seidel
  11. State-of-the-art seminar T.E.Wabe
  12. MRS Symp. Proc. v.381 K.R. Carter;H.J.Cha;R.A.Dipietro;C.J. Hawker;J.L.Hedrick;J.W.Labadie;J.E.Mcgrath;T.P.Russell;M.I.Sanchez;S.A.Swanson;W.Volkse;D.Y.Yoon
  13. Low dielectric constant materials for deep submicron interconnections applications MRS 96 Fall Meeting Tutorials J.Leu;T.-M. Lu;P.S.Ho