한국응용과학기술학회지 (Journal of the Korean Applied Science and Technology)
- 제13권3호
- /
- Pages.145-153
- /
- 1996
- /
- 1225-9098(pISSN)
- /
- 2288-1069(eISSN)
DOI QR Code
NDAS 유도체의 합성과 감광특성
Synthesis and Photosensitive Characterization of NDAS Derivatives
- Lee, Ki-Chang (Dept. of Chemical engineering Myong Ji University) ;
- Choi, Sung-Yong (Dept. of Chemical engineering Myong Ji University) ;
- Bae, Nam-Kyoung (Dept. of Chemical engineering Myong Ji University) ;
- Yoon, Cheol-Hun (Dept. of Chemical engineering Myong Ji University) ;
- Hwang, Sung-Kwy (Dept. of Chemical engineering Myong Ji University)
- 발행 : 1996.11.30
초록
Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.
키워드