한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제29권6호
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- Pages.869-875
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- 1996
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
ICP ETCHING OF TUNGSTEN FOR X-RAY MASKS
- Jeong, C. (Department of Materials Engineering, Hanyang University) ;
- Song, K. (LG Electronics Research Center) ;
- Park, C. (LG Electronics Research Center) ;
- Jeon, Y. (LG Electronics Research Center) ;
- Lee, D. (LG Electronics Research Center) ;
- Ahn, J. (Department of Materials Engineering, Hanyang University)
- 발행 : 1996.12.01
초록
In this article the effects of process parameters of inductively coupled plasma etching with
키워드