EFFECTS OF GAS PRESSURES ON GRANULAR STRUCTURE'S FOR MATION OF ALUMINUM FILMS PREPARED BY PVD PROCESS

In order to investigate the influence of gas pressure in PVD deposition conditions, aluminum films were prepared by vacuum evaporation and ion plating. The crystal orientation and morphology of the films affected by argon gas pressures were characterized by using X-ray diffraction (XRD) and scanning electron micrography (SEM) respectively. With the increasing of argon gas pressure, the preferred orientation of aluminum films exhibited (200) and the diffraction peaks of the films became less sharp and broadened. Film's morphology changed from columnar structure to granular structure with the increase of gas pressure. And the properties of these films on corrosion behaviors were estimated by measuring anodic polarization curves in deaerated 3% NaCl solution. The aluminum films which exhibited granular structure with (200) preferred orientation showed good corrosion resistance.