Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 29 Issue 5
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- Pages.512-518
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- 1996
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
STRUCTURE AND MACHANICAL PROPERTIES OF a-C:N MULTILAYER FILMS PREPARED BY ARC ION PLATING
- Kitagawa, Toshihisa (Department of Materials Processing Engineering, Nagoya University) ;
- Taki, Yusuke (Department of Materials Processing Engineering, Nagoya University) ;
- Takai, Osamu (Department of Materials Processing Engineering, Nagoya University)
- Published : 1996.10.01
Abstract
Amorphous carbon nitride (a-C:N) multilayerfilms are formed by using altermating conditions during film deposition in are ion plating process. Because hard a-C:N films prepared with suitable megative bias voltages have large compressive stress, it is difficult to increase film thickness more than 200nm. Preparing multilayer films composed of hard layers and soft layers, we can grow thick multilayer films on Si and SKH steel substrate. The total thickness of multilayer films is more than 1
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