THIN FILM ADHESION IN Cu/Cr/POLYIMIDE AND Cu/Cu-Cr/POLYIMIDE SYSTEMS

  • Joh, Cheol-Ho (Dept. of Materials Engineering, Hanyang University) ;
  • Kim, Young-Ho (Dept. of Materials Engineering, Hanyang University) ;
  • Oh, Tae-Sung (Dept. of Metall. and Mater. Sci., Hongik University) ;
  • Park, Ik-Sung (Dept. of Mater. Sci. and Eng., KAIST) ;
  • Yu, Jin (Dept. of Mater. Sci. and Eng., KAIST)
  • Published : 1996.10.01

Abstract

Adhesion of Cu/Cr and Cu/$Cu_xCr_{1-x}$ thin films onto polyimide substrates has been studied. For an adhesion layer, Cr or Cu-Cr alloy films were deposited onto polyimide using DC magnetron sputtering machine. Then Cu was sputter-deposited and finally, Cu was electroplated. Adhesion was evaluated using $90^{\circ}C$ peel test or T-peel test. Plastic deformation of the peeled metal layer was qualitatively measured using XRD technique. It is confirmed that high interfacial fracture energy and large plastic deformation are important to enhance the peel adhesion strength. High peel strength is obtained when the interface is strongly bonded. More ductile film has higher peel strength. In Cu-Cr alloy films, opposite effects of the Cr addition in the alloy film on the peel strength are operative: a beneficial effect of strong interfacial bonding and a negative effect of smaller plastic deformation.

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