한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제29권5호
  • /
  • Pages.363-370
  • /
  • 1996
  • /
  • 1225-8024(pISSN)
  • /
  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지

SYNTHESIS OF CARBON NITRIDE THIN FILMS BY PLASMA PROCESSING

  • Takai, Osamu (Department of Materials Processing Engineering, Nagoya University) ;
  • Taki, Yusuke (Department of Materials Processing Engineering, Nagoya University) ;
  • Kitagawa, Toshihisa (Department of Materials Processing Engineering, Nagoya University)
  • 발행 : 1996.10.01
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초록

Carbon nitride is one of the new carbon materials which show interesting properties. After the theoretical calculation by LIu and Cohen, many researchers are trying to prepare $\beta$-$C_3N_4$ which may be harder than diamond. Many carbon nitride films synthesized till now by various methods are amorphous and the N/C ratios in the films are usually below 0.5. First we review shortly the synthesis of carbon nitride thin films by plasma, ion and laser processing. Second we report on the preparation of amorphous carbon nitride thin films by shielded arc ion plating and the structural and mechanical properties of the films.

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