References
- J. Appl. Phys. v.67 J.W.Zou;K.Schmidt;K.Reichelt;B.Dischler
- Thin Solid Films v.86 L.P.Anderson
- J. Appl. Phys. v.59 J.Wanger;P.Lautenschlager
- Appl. Phys. Commun. v.8 T.Katta;J.A.Wooliam;W.Notohamiprodjo
- Thin Solid Films v.81 N.Mutuda;S.Baba;A.Kinbara
- Thin Solid Films v.80 K.Enke
- Thin Solid Films v.112 G.Gille;B.Rau
- Thin Solid Films v.148 D.B.Kerwin;I.L.Spain;R.S.Robinson;B.Daudin;M.Dubus;J.Fontenille
- J. Vac. Sci. Technol. v.A4 D.Nir
- Jr. Appl. Phys. Lett. v.60 D.F.Franceschini;C.A.Achete;F.L.Freire
- The Materials Science of Thin Films M.Ohring;H.B.Jovanovich(ed.)
- Thin Solid Films v.144 Y.Catherine;P.Couderc
- J. Appl. Phys. v.57 K.Kohler;J.W.Cobum;D.E.Horne;E.Kay;J.H.Keller
- J. Vac. Sci. Technol. v.A5 H.Tsai;D.B.Bogy
- Phys. Rev. v.B29 R.O.Dillon;J.A.Woollam;V.Katkanant
- Phys. Rev. v.B11 M.H.Grimsditch;A.K.Ramdas
- Chem. Phys. v.53 F.Tuinstra;J.L.Koenig
- Phys. Rev. v.B30 D.Beeman;J.Silverman;R.Lynds;M.R.Anderson
- J. Appl. Phys. v.31 M.A.Tamor;C.H.Wu
- Jpn. J. Appl. Phys. v.31 F.Rossi;B.Andre
- Plasma Deposited Thin Films v.89 J.C.Angus;P.Koidl;S.Domitz;J.Mort,(ed.);F.Jansen,(ed.)
- J. Vac. Sci. Technol. v.A0 H.Windischmann