References
- J. Appl. Phys v.40 D.W. Chapman
- Science v.246 J.F. Scott;C.A.P. Araujo
- J. Appl. Phys. v.43 R.C. Neville;B. Hoeneisen;C.A. Mead
- Sensors and Actuator v.A46-47 J. Lapalainen;J. Frantti;H. Moilanen;S. Lepavuori
- Proceedings of the 9th IEEE International Symposium on Applications of Ferroelectrics,1994 v.520 K.G. Brooks;D. Damjaovic;N. Setter;P. Luginbuhl;G.A. Racine;N.F. de Rooij
- Appl. Phy. Lett v.52 K. Sreenivas;M. Sayer;D. Jbarr;M. Nishioka
- J. Appl. Phys v.60 K. Iijima;Y. Tomita;R. Takayama;I. Ueda
- J. Appl. Phys. v.75 K. Sreenivas;I. Reaney;T. Maeder;N. Setter;C. Jagadish;R.G. Elliman
- J. Electrochem. Soc. v.140 D.P. Vijay;S.B. Desu
- Proceedings of the 3rd Interational Symposium on Intergrated Ferroelectris v.612 P.D. Hren;S.H. Rou;H.N. Al-Shareef;M.S. Ameen;O. Auciello;A.I. Kingon
- MRS Symp. Proc. v.200 C.K. Kwok;S.B. Desu;L. Kamerdiner
- Proceedings of the 6th Interational Symposium on Intergated Ferroelectrics v.853 E.M. Griswold;M. Sayer;L. Weaver
- Proceedings of the 3rd IUMRS International Conference in Asia v.2 T.G. Lee;Y.H. Kim;D.K. Choi;O.K. Kwon
- Proceeding of the 4th International Symposium on Intergrated Ferroelectrics v.181 H.N. Al-Shareef;K.D. Gifford;P.D. Hren;S.H. Rou;O. Auchiello;A.I. Kingon
- Surface Science v.149 P.T. Dawson;K.K. Tzatizov
- J. Adhesion Sci. Technol. v.3 J. Kim;K.S. Kim;Y.H. Kim
- J. Adhesion Sci. Technol v.8 T.G. Chung;Y.H. Kim;J. Yu
- Handbook of Multilevel Metallization for Intergrated Circuits S.R. Wilson;C.J. Tracy;J.L. Freeman, Jr.
- 한국표면공학회지 v.28 이태곤;임준홍;김영호
- J. Vac. Sci. Technol v.A10 B.K. Furman;K.D. Childs;H. Clearfielld;R. Davis;S. Purushothaman