Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 33A Issue 12
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- Pages.47-52
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- 1996
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- 1016-135X(pISSN)
Al corrosion phenomena on the Al grain boundary after AlCu plasma etching
AlCu 플라즈마 식각후 Al 결정입계에서 Al 부식현상
Abstract
Cl-based gas chemistry is generally used to etching for al alloy metallization. After the etching of Al alloy with Cl-based gas plasma, residual chlorine on Al alloy reacts with H
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