대한전기학회논문지 (The Transactions of the Korean Institute of Electrical Engineers)
- 제45권1호
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- Pages.93-99
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- 1996
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- 0254-4172(pISSN)
전기화학적 처리에 의한 다공질 실리콘 산화막의 형성과 감습 특성
Formation and humidity-sensing properties of porous silicon oxide films by the electrochemical treatment
초록
The formation properties and oxidation mechanism of electrochemically oxidized porous silicon(OPS) films have been studied. To examine the humidity-sensitive properties of OPS films, surface-type and bulk-type humidity sensors were fabricated. The oxidized thickness of porous silicon layer(PSL) increases with the charge supplied during electrochemical humidity sensor shows high sensitivity at high relative humidity in low temperature. The sensitivity and linearity can be improved by optimizing a porosity of PSL. (author). refs., figs.