The Transactions of the Korean Institute of Electrical Engineers (대한전기학회논문지)
- Volume 45 Issue 3
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- Pages.438-443
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- 1996
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- 0254-4172(pISSN)
Resist characteristics and molecular structure control of polystyrene by plasma polymerization method
플라즈마중합법에 의한 폴리스티렌의 분자구조 제에 및 레지스트 특성 조사
Abstract
The effect of plasma polymerization conditions on the structure of the plasma polymerized styrene were investigated by using Fourier Transform Infrared Ray(FT-IR), Differential Scanning Calorimetry (DSC), Gel Permeation Chromatography(GPC). Plasma polymerized thin film was prepared using an interelectrode inductively coupled gas-flow-type reactor. We show that polymerization parameters of thin film affect sensitivity and etching resistance of plasma polymerized styrene is 1.41~3.93, and deposition rate of that are 32~383[.angs./min] with discharge power. Swelling and etching resistance becomes more improved with increasing discharge power during plasma polymerization. (author). 11 refs., 10 figs., 1 tab.