한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제28권6호
- /
- Pages.386-392
- /
- 1995
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
Crystallographic Characteristics of ZnO Films Deposited on SiO$_2$ /Si Substrate
- Park, H.D. (Department of physics, National Fisheries University of Pusan) ;
- Kim, K.S. (Department of physics, National Fisheries University of Pusan) ;
- Lee, C.S. (Department of physics, National Fisheries University of Pusan) ;
- Kim, J.W. (Department of physics, Korea Advanced Institute of Science and Technology) ;
- Han, B.M. (Department of physics, Korea Advanced Institute of Science and Technology) ;
- Kim, S.Y. (Department of physics, Korea Advanced Institute of Science and Technology)
- 발행 : 1995.12.01
초록
The RF planar magnetron sputtering technique was used to fabricate uniform ZnO/
키워드