Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 28 Issue 4
- /
- Pages.225-235
- /
- 1995
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
Effects of Pretreatment Condition and Substrate Bias on the Characteristics of MPECVD Diamond Thin Films
전처리조건과 기판Bias가 MPECVD 다이아몬드 박막의 특성에 미치는 영향
Abstract
To investigate the effects of pretreatment and substrate bias on the characteristics of the diamond thin films, the thin films were deposited on the p-type Si(100) wafer by MPECVD using mixtures of
Keywords