Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 32A Issue 3
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- Pages.118-123
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- 1995
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- 1016-135X(pISSN)
A super low noise characteristics of AlGaAs/InGaAs/GaAs pseudomorphic HEMTs fabricated by the improved T-Gate
개선된 T-gate기술로 제작한 초저잡음 AlGaAs/InGaAs/GaAs pseudomorphic HEMT 소자의 특성
Abstract
We have successfully fabricated a super low noise pseudomorphic HEMT(PHEMT) device with AlGaAs/InGaAs/GaAs sturcture by using improved T-Gate which have increased a large gaet cross-sectional area about two times in comparision with those of conventional T-gate processes. The PHEMSTs with 0.15
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