Journal of the Korean Vacuum Society (한국진공학회지)
- Volume 4 Issue S2
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- Pages.64-68
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- 1995
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- 1225-8822(pISSN)
EFFECT OF $SiF_4$ ADDITION ON THE STRUCTURES OF SILICON FILMS DEPOSITED AT LOW TEMPERATURE BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Xiaodong Li (Department of Chemical Engineering, Pohang University of Science and Technology) ;
- Park, Young-Bae (Department of Chemical Engineering, Pohang University of Science and Technology) ;
- Kim, Dong-Hwan (Department of Chemical Engineering, Pohang University of Science and Technology) ;
- Rhee, Shi-Woo (Department of Chemical Engineering, Pohang University of Science and Technology)
- Published : 1995.06.01
Abstract
Silicon films were deposited at
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