STUDY OF MULTILAYER STRUCTURE USING X-RAY DOUBLE CRYSTAL DIFFRACTION

  • Wu, Yunzhong (Transducer Technology Shanghai Institute of Metallurgy, Chinese Academy of Sciences) ;
  • Xu, Xueming (Transducer Technology Shanghai Institute of Metallurgy, Chinese Academy of Sciences) ;
  • Wang, Weiyuan (Transducer Technology Shanghai Institute of Metallurgy, Chinese Academy of Sciences)
  • Published : 1995.06.01

Abstract

By using X-ray double crystal diffraction technique the multilayer structure composed of glass membrane, platinum film and $\alpha Al_2O_3$ substrate has been studied. It is found the stress is produced in the film by thermal mismatch within multilayer materials. The measuring results of thin film platinum resistors show that the stress were induce resistance change of device and different stress status will produce add resistance in different direction. Selecting proper glass material can make opposite stress in Pt film and opposite add resistance due to thermal mismatch. The reliability of Pt resistor has been improved with method of this stress compensation.

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