THE EFFECT OF INTERNAL STRESS ON THE SOFT MAGNETIC PROPERTIES OF PERMALLOY THIN FILMS

  • Kim, Hyun-Tae (Department of Metallurgical Engineering, Seoul National University) ;
  • Kim, Sang-Joo (Department of Metallurgical Engineering, Seoul National University) ;
  • Han, Suk-Hee (Division of Metals, Korea Institute of Science and Technology) ;
  • Kim, Hi-Jung (Division of Metals, Korea Institute of Science and Technology) ;
  • Kang, Il-Koo (Division of Metals, Korea Institute of Science and Technology)
  • 발행 : 1995.10.01

초록

The stress in Permalloy thin films fabricated by rf magnetron sputtering on the Si (100) substrates has been investigated with various deposition parameters such as the film thickness, argon pressure, and rf power. The internal stress changes from compressive to tensile with higher input power and argon pressure. The cause of stress variations with these deposition parameters is discussed in terms of thermal and/or intrinsic stress changes. Low coercive force is obtained from Permalloy thin films at a condition of low compressive stress.

키워드

참고문헌

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